The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2015

Filed:

May. 30, 2012
Applicants:

Hans Klaas Van Dijk, Echt, NL;

Konraad Dullaert, Echt, NL;

Inventors:

Hans Klaas Van Dijk, Echt, NL;

Konraad Dullaert, Echt, NL;

Assignee:

DSM IP ASSETS B.V., Heerlen, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 77/06 (2006.01); C08K 3/22 (2006.01);
U.S. Cl.
CPC ...
C08L 77/06 (2013.01); C08K 3/22 (2013.01); C08K 2003/2241 (2013.01); C08L 2205/02 (2013.01);
Abstract

The invention relates to a polyamide composition with an improved resistance against yellowing. The invention also relates to a shaped article made from the composition and to a method of forming such a shaped article. The polyamide composition comprises: a. 90 to 40 wt % of one or more semi-aromatic polyamides and b.10 to 60 wt % of one or more of aliphatic polyamides and c.1 at least one white pigment as secondary component and c.2 optionally one or more other secondary components, wherein the sum of the amount of semi-aromatic and aliphatic polyamide is 100 wt % and wherein: i. the semi-aromatic polyamide is derived from one or more aliphatic diamine monomers containing 4 to 12 carbon atoms and one or more benzene dicarboxylic acid monomers and ii. the aliphatic polyamide is derived from one or more aliphatic diamine monomers containing 4 to 10 carbon atoms and one or more aliphatic dicarboxylic acids with 6 to 12 carbon atoms with the proviso that no additional thermally conductive material is present in the composition.


Find Patent Forward Citations

Loading…