The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2015
Filed:
May. 31, 2011
Zhijuan Sun, Hangzhou, CN;
Xiang Gao, Hangzhou, CN;
Yingwu Luo, Hangzhou, CN;
ZHEJIANG UNIVERSITY, , CN;
Abstract
A method for preparing a porous anti-reflective thin film composed of hollow polymer nano-particles is provided in the following steps: Firstly, an aqueous dispersion having mass percent of 3-7% is prepared using polymer nano-capsules. A thin film comprising polymer nano-capsules is formed by spin coating on one side or both sides of the substrate using a spin coater. The thin film comprising polymer nano-capsules is dried in vacuum at high temperature. After the core materials of the polymer nano-capsules evaporate completely, the polymer nano-capsules turn into hollow polymer nano-particles, and a porous anti-reflective thin film composed of hollow polymer nano-particles is prepared. The thickness and refractive index of the thin film are adjusted conveniently and effectively by changing the concentration of polymer nano-capsules aqueous dispersion and the hollow volume rate of the polymer nano-particles. The thin film has the advantages of high mechanical intensity and abrasion resistance.