The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2015

Filed:

Apr. 25, 2013
Applicants:

Behzad Biglarbegian, Toronto, CA;

Mohammad Fakharzadeh, Toronto, CA;

Inventors:

Behzad Biglarbegian, Toronto, CA;

Mohammad Fakharzadeh, Toronto, CA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01P 5/08 (2006.01); H01P 11/00 (2006.01); H01Q 21/00 (2006.01); H01P 5/107 (2006.01); H01Q 13/02 (2006.01);
U.S. Cl.
CPC ...
H01P 5/08 (2013.01); H01P 5/107 (2013.01); H01P 11/00 (2013.01); H01P 11/001 (2013.01); H01Q 13/02 (2013.01); H01Q 21/0075 (2013.01); Y10T 29/49016 (2015.01);
Abstract

An antenna apparatus comprises a substrate with a microstrip-to-waveguide transition comprising a microstrip feedline extending between a first terminal point and a second terminal point at a first metal layer and comprising a microstrip element and a probe element. The microstrip element includes a connection segment extending from the first terminal point to a second point, a taper segment extending from the second point to a third point, and a continuous-width segment extending from the third point to a fourth point. The probe element extends from the fourth point to the second terminal point and has a width which is narrower than the continuous-width segment. The substrate further includes a waveguide opening comprising a region surrounding the probe element and includes a plurality of metal vias disposed at the perimeter of the waveguide opening and which extend from the first metal layer to the second metal layer.


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