The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2015

Filed:

Feb. 02, 2012
Applicants:

Bernd Hintze, Langebrueck, DE;

Frank Koschinsky, Radebeul, DE;

Inventors:

Bernd Hintze, Langebrueck, DE;

Frank Koschinsky, Radebeul, DE;

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/32 (2006.01); H01L 21/321 (2006.01); H01L 21/3205 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/321 (2013.01); H01L 21/32051 (2013.01); H01L 21/76861 (2013.01); H01L 21/76864 (2013.01);
Abstract

Disclosed herein are various methods of forming metal nitride layers on various types of semiconductor devices. In one example, the method includes forming a layer of insulating material above a semiconducting substrate, performing a physical vapor deposition process to form a metal nitride layer above the layer of insulating material, wherein the metal nitride layer has an intrinsic as-deposited stress level, and performing at least one process operation on the metal nitride layer to reduce a magnitude of the intrinsic as-deposited stress level in the metal nitride layer.


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