The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2015
Filed:
Mar. 26, 2014
Case Western Reserve University, Cleveland, OH (US);
Anant Madabhushi, Beachwood, OH (US);
George Lee, Parlin, NJ (US);
Sahirzeeshan Ali, Houston, TX (US);
Rachel Sparks, Seattle, WA (US);
Other;
Abstract
Apparatus, methods, and other embodiments associated with objectively predicting biochemical recurrence with co-occurring gland tensors in localized subgraphs are described. One example apparatus includes a set of logics that associate directional disorder with a risk of failure in a material. A first logic detects a fundamental unit of composition in the material, segments boundaries of the fundamental unit, and calculates a directional tensor for the fundamental unit. A second logic constructs a localized sparsified subgraph whose nodes represent centroids of the fundamental units, defines pairwise spatial relationships between the fundamental units, and constructs a directional co-occurrence matrix based on the spatial relationships. A third logic derives second order statistical features from the co-occurrence matrix, and produces a risk failure score as a function of the second order statistical features. The second order statistical features include the entropy of the directional organization of the fundamental units.