The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2015
Filed:
Dec. 09, 2010
Jeong-woo Lee, Uiwang-si, KR;
Yong-sik Yoo, Uiwang-si, KR;
Hyun-yong Cho, Uiwang-si, KR;
Ji-young Jeong, Uiwang-si, KR;
Doo-young Jung, Uiwang-si, KR;
Jong-hwa Lee, Uiwang-si, KR;
Min-kook Chung, Uiwang-si, KR;
Myoung-hwan Cha, Uiwang-si, KR;
Hwan-sung Cheon, Uiwang-si, KR;
Jeong-Woo Lee, Uiwang-si, KR;
Yong-Sik Yoo, Uiwang-si, KR;
Hyun-Yong Cho, Uiwang-si, KR;
Ji-Young Jeong, Uiwang-si, KR;
Doo-Young Jung, Uiwang-si, KR;
Jong-Hwa Lee, Uiwang-si, KR;
Min-Kook Chung, Uiwang-si, KR;
Myoung-Hwan Cha, Uiwang-si, KR;
Hwan-Sung Cheon, Uiwang-si, KR;
Cheil Industries Inc., Gumi-si, KR;
Abstract
This disclosure relates to a positive photosensitive resin composition including (A) a resin precursor including a polybenzoxazole precursor, a polyamic acid, or a combination thereof, (B) a dissolution-controlling agent having a boiling point ranging from about 210° C. to about 400° C. and a polarity ranging from about 1 D to about 4 D, (C) an acid generator, (D) a silane-based compound, and (E) a solvent. The polybenzoxazole precursor includes a repeating unit represented by Chemical Formula 1, or both of repeating units represented by Chemical Formulae 1 and 2 and has a thermally polymerizable functional group at at least one end. The polyamic acid includes a repeating unit of Chemical Formulae 50 and 51.