The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2015
Filed:
Aug. 25, 2014
Fujifilm Corporation, Tokyo, JP;
Masashi Ueshima, Ashigarakami-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
In the optimization of a non-discharge correction parameter for correcting a non-discharge using a non-discharge correction nozzle, a first test chart including a non-recording region that is the recording position of the non-discharge correction nozzle, a measurement chart region where a measurement chart is formed, and a uniform concentration region is formed for a designated nozzle that is previously designated. Then, the first test chart is read, the reading data is analyzed, the concentration at the measurement chart and the concentration at the uniform concentration region are compared for each non-discharge correction parameter, and a non-discharge correction parameter corresponding to the concentration at the measurement chart that minimizes the concentration difference from the uniform concentration region is derived as the optimum value of the non-discharge correction parameter for the designated nozzle.