The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2015

Filed:

May. 10, 2013
Applicant:

Sciaky, Inc., Chicago, IL (US);

Inventors:

Scott Stecker, Willow Springs, IL (US);

Phillip E. Wollenhaupt, Crown Point, IN (US);

Assignee:

SCIAKY, INC., Chicago, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 15/00 (2006.01); B23K 15/02 (2006.01); B23K 26/34 (2014.01); B23K 15/06 (2006.01);
U.S. Cl.
CPC ...
B23K 15/0086 (2013.01); B23K 15/02 (2013.01); B23K 15/06 (2013.01); B23K 26/34 (2013.01); B23K 26/345 (2013.01); B23K 15/00 (2013.01);
Abstract

A method for layer-by-layer manufacturing of a three-dimensional work piece, including: (a) delivering a metallic feed material into a feed region; (b) emitting an electron beam; (c) translating the electron beam through a first predetermined raster pattern frame that includes: (i) a plurality of points within the feed region; and (ii) a plurality of points in a substrate region that is outside of the feed region; (d) monitoring a condition of the feed region or the substrate region for the occurrence of any deviation from a predetermined condition; (e) upon detecting of any deviation, translating the electron beam through at least one second predetermined raster pattern frame that maintains the melting beam power density level substantially the same, but alters the substrate beam power density level; and (f) repeating steps (a) through (e) at one or more second locations for building up layer-by-layer.


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