The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2015
Filed:
Jan. 31, 2011
Applicants:
Kyung-sang Cho, Gwacheon-si, KR;
Dae-young Chung, Yongin-si, KR;
Sang-jin Lee, Anyang-si, KR;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/00 (2006.01); B05D 3/14 (2006.01); B82Y 30/00 (2011.01); B05D 3/12 (2006.01); B05D 5/06 (2006.01); B05D 5/12 (2006.01); G02F 1/167 (2006.01);
U.S. Cl.
CPC ...
B05D 3/14 (2013.01); B82Y 30/00 (2013.01); B05D 3/12 (2013.01); B05D 5/061 (2013.01); B05D 5/12 (2013.01); G02F 2001/1678 (2013.01);
Abstract
A particle has a permanent dipole moment, a film includes the particle, and a method of forming the film includes aligning the particle on a surface. The particle has a permanent dipole moment and includes heterogeneous materials, wherein a positive pole is located in a first material and a negative pole is located in a second material different from the first material. The method includes aligning a particle such that the particle has one dipole moment direction. The film includes the aligned particles.