The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Sep. 30, 2014
Samsung Electronics Co., Ltd., Suwon-si, KR;
Yang Ho Cho, Hwaseong-si, KR;
Du-Sik Park, Suwon-si, KR;
Ho Young Lee, Suwon-si, KR;
Kyu Young Hwang, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method and apparatus for processing a multi-view image are provided. A priority may be assigned to each hole pixel in a hole region generated when an output view is generated. The priority of each hole pixel may be generated by combining a structure priority, a confidence priority, and a disparity priority. Hole rendering may be applied to a target patch including a hole pixel having a highest priority. The hole pixel may be restored by searching for a source patch most similar to a background of the target patch, and copying a pixel in the found source patch into a hole pixel of the target patch.