The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2015

Filed:

Oct. 21, 2011
Applicants:

Farzad Parvaresh, Menlo Park, CA (US);

Andrew J Patti, Cupertino, CA (US);

Ramin Samadani, Palo Alto, CA (US);

Inventors:

Farzad Parvaresh, Menlo Park, CA (US);

Andrew J Patti, Cupertino, CA (US);

Ramin Samadani, Palo Alto, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/335 (2011.01); H04N 9/04 (2006.01); H04N 3/14 (2006.01); H04N 9/083 (2006.01); H04N 5/225 (2006.01);
U.S. Cl.
CPC ...
H04N 9/083 (2013.01); H04N 5/2254 (2013.01); H04N 9/045 (2013.01);
Abstract

A color image capture systems comprised of: a lens; a light sensitive sensor; a first wavelength dependent masklocated on an optical pathbetween the lens and sensor, wherein the first wavelength dependent maskincludes a first attenuation pattern for modulation of a light field; and a second wavelength dependent mask, wherein the second wavelength dependent mask includes a second attenuation pattern to modulate the modulated light field from the first wavelength dependent mask, the second wavelength dependent mask located on the optical pathbetween the first wavelength dependent mask and the sensor, further wherein the second wavelength dependent mask is separated from the sensor by a distance d.


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