The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2015

Filed:

Jul. 23, 2013
Applicant:

Electronics and Telecommunications Research Institute, Daejeon, KR;

Inventors:

Gyungock Kim, Daejeon, KR;

Sang Hoon Kim, Daejeon, KR;

Ki Seok Jang, Daejeon, KR;

In Gyoo Kim, Daejeon, KR;

Jin Hyuk Oh, Uijungbu, KR;

Sun Ae Kim, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/06 (2010.01); H01L 33/00 (2010.01); H01L 31/0352 (2006.01); H01L 31/107 (2006.01); B82Y 20/00 (2011.01);
U.S. Cl.
CPC ...
H01L 33/06 (2013.01); H01L 31/035227 (2013.01); H01L 31/035254 (2013.01); H01L 31/107 (2013.01); H01L 33/0054 (2013.01); B82Y 20/00 (2013.01); Y10S 977/762 (2013.01); Y10S 977/774 (2013.01); Y10S 977/954 (2013.01);
Abstract

Provided is a silicon-wafer-based germanium semiconductor photodetector configured to be able to provide properties of high gain, high sensitivity, and high speed, at a relatively low voltage. A germanium-based carrier multiplication layer (e.g., a single germanium layer or a germanium and silicon superlattice layer) may be provided on a silicon wafer, and a germanium charge layer may be provided thereon, a germanium absorption layer may be provided on the charge layer, and a polysilicon second contact layer may be provided on the absorption layer. The absorption layer may be configured to include germanium quantum dots or wires.


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