The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Feb. 21, 2014
Globalfoundries Inc., Grand Cayman, KY;
Daniel Fischer, Dresden, DE;
Carsten Hartig, Meerane, DE;
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
Methods of determining an amount and/or a thickness of residual material in a via based on LL-BSE images of the material are disclosed. Embodiments include etching a plurality of vias through at least one material layer on a wafer; loading the wafer with predetermined measurement parameters in a CD-SEM; acquiring an image of each via of interest using LL-BSE imaging; quantifying grey level values of the images; characterizing residuals of the at least one material layer in each via based on the grey level values; determining an etching success rate based on the characterizing of the residuals; adjusting the etching based on the determining of the etching success rate; and repeating the steps of acquiring, quantifying, characterizing, determining, and adjusting until a desired etching success rate is achieved.