The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Sep. 14, 2012
Applicants:
Shinji Yashima, Toyama, JP;
Atsushi Umekawa, Toyama, JP;
Inventors:
Shinji Yashima, Toyama, JP;
Atsushi Umekawa, Toyama, JP;
Assignee:
HITACHI KOKUSAIELECTRIC INC., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/263 (2006.01); H05B 6/80 (2006.01);
U.S. Cl.
CPC ...
H01L 21/263 (2013.01); H05B 6/806 (2013.01);
Abstract
A substrate processing apparatus includes a process chamber which processes a substrate, a conductive substrate support table which is installed within the process chamber, a dielectric plate on which the substrate is mounted, the dielectric plate being placed on the substrate support table, a microwave generator which is installed outside the process chamber, and a microwave supplying unit which supplies a microwave generated by the microwave generator into the process chamber.