The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Nov. 06, 2014
Shimadzu Corporation, Kyoto-shi, Kyoto, JP;
Shinji Funatsu, Kyoto, JP;
Noriyuki Ojima, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto, JP;
Abstract
Mass analysis is performed on the same sample while changing the cooling gas supply rate to the ion trap, i.e. the gas pressure conditions, and the respective mass spectra are obtained. Under high gas, ion energy will decrease and modifiers such as phosphate groups will not detach readily, while under low gas, ion energy will remain high and so detachment of modifiers will occur readily. Thus, between multiple mass spectra obtained while changing the gas pressure, if the mass difference between a peak for which signal intensity increased and a peak for which it decreased corresponds to the mass of a known modifier or an integer multiple thereof, it can be inferred that those peaks have the same basic structure and differ only in the number of modifiers. Thus, such peaks are selected as precursor ions to perform MSanalysis and structural analysis.