The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2015

Filed:

Jun. 10, 2013
Applicant:

Comet Technologies Usa, Inc., San Jose, CA (US);

Inventor:

Jack Gilmore, Fort Collins, CO (US);

Assignee:

COMET Technologies USA, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B 37/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32183 (2013.01);
Abstract

A plasma processing system may include a radio frequency (RF) generator configured to supply a pulsing process signal to a target in a plasma processing chamber via a RF matching network. A phase and magnitude detector circuit is coupled to the RF generator and configured to sense the pulsing process signal and output a magnitude error signal and a phase error signal. A pulse tracking circuit is electrically coupled to the phase and magnitude detector circuit and configured to receive the magnitude error signal and the phase error signal and output a tracked magnitude signal and a tracked phase signal. A match controller is electrically coupled to the pulse tracking circuit and the RF matching network and configured to receive the tracked magnitude signal and the tracked phase signal and vary an impedance of the RF matching network in response to the tracked magnitude and phase signals.


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