The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Dec. 23, 2013
International Business Machines Corporation, Armonk, NY (US);
Nathan Buck, Underhill, VT (US);
Brian Dreibelbis, Underhill, VT (US);
John P. Dubuque, Jericho, VT (US);
Eric A. Foreman, Fairfax, VT (US);
Peter A. Habitz, Hinesburg, VT (US);
David J. Hathaway, Underhill, VT (US);
Jeffrey G. Hemmett, Bolton Valley, VT (US);
Natesan Venkateswaran, Hopewell Junction, NY (US);
Chandramouli Visweswariah, Croton-on-Hudson, NY (US);
Vladimir Zolotov, Putnam Valley, NY (US);
GLOBALFOUNDRIES U.S. 2 LLC, Hopewell Junction, NY (US);
Abstract
Systems and methods are provided for extracting parasitics in a design of an integrated circuit with multi-patterning requirements. The method includes determining resistance solutions and capacitance solutions. The method further includes performing parasitic extraction of the resistance solutions and the capacitance solutions to generate mean values for the resistance solutions and the capacitance solutions. The method further includes capturing a multi-patterning source of variation for each of the resistance solutions and the capacitance solutions during the parasitic extraction. The method further includes determining a sensitivity for each captured source of variation to a respective vector of parameters. The method further includes determining statistical parasitics by multiplying each of the resistance solutions and the capacitance solutions by the determined sensitivity for each respective captured source of variation. The method further includes generating as output the statistical parasitics in at least one of a vector form and a collapsed reduced vector form.