The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2015

Filed:

Jun. 19, 2012
Applicants:

Huirong Yao, Plainboro, NJ (US);

Guanyang Lin, Whitehouse Station, NJ (US);

Joonyeon Cho, Bridgewater, NJ (US);

Inventors:

Huirong Yao, Plainboro, NJ (US);

Guanyang Lin, Whitehouse Station, NJ (US);

JoonYeon Cho, Bridgewater, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); G03F 7/168 (2013.01); G03F 7/40 (2013.01);
Abstract

The present invention relates to a novel antireflective coating composition comprising a polymer obtained from a reaction product of at least one amino compound chosen from the group consisting of a polymer with repeat unit of structure (1), structure (2) and mixtures thereof reacted with a hydroxy compound chosen from the group consisting of structure (3), structure (4) and mixtures thereof, and, a thermal acid generator. The invention also relates to a process for using the novel composition in lithography.


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