The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Feb. 27, 2013
Applicant:
New Power Plasma Co., Ltd., Gyeonggi-do, KR;
Inventor:
Sang-Don Choi, Gyeonggi-do, KR;
Assignee:
NEW POWER PLASMA CO., LTD., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01); G01R 31/24 (2006.01); H05H 1/46 (2006.01); G01R 19/00 (2006.01); H05H 1/00 (2006.01); H01J 37/32 (2006.01); G01R 27/08 (2006.01);
U.S. Cl.
CPC ...
G01R 31/245 (2013.01); G01R 19/0061 (2013.01); H01J 37/32082 (2013.01); H01J 37/32944 (2013.01); H05H 1/0081 (2013.01); H05H 1/46 (2013.01); G01R 27/08 (2013.01);
Abstract
An apparatus for detecting an arc in a plasma chamber is designed to detect the respective voltage and current values of RF power supplied to the plasma chamber and calculate the ratio of the voltage and current values to accomplish a required control of the supplying of the power. When it is determined that the arc is generated, the apparatus rapidly controls the supplying of the power to prevent damages on the plasma chamber and contaminations on the materials to be processed due to the generation of the arc.