The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9170171 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 27, 2015

Filed:

Nov. 18, 2013
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Yasuyuki Unno, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/00 (2006.01); G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G01M 11/0257 (2013.01);
Abstract

A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Optical paths from the positions of the measured spot images toward a light source are calculated, parameters of the test optical system when light rays from the positions of the spot images converge at the light source are specified, and a wavefront aberration of the test optical system corresponding to the parameters of the test optical system is calculated.


Find Patent Forward Citations

Unno, Yasuyuki. (2015). Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording medium (U.S. Patent No. 9170171). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9170171

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