The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Sep. 18, 2013
Dow Global Technologies Llc, Midland, MI (US);
Scott T. Matteucci, Midland, MI (US);
Junqiang Liu, Midland, MI (US);
Ahmad Madkour, Canton, MI (US);
William J. Harris, Lake Jackson, TX (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
The present invention appreciates that compounds comprising nitrogen-containing moieties that are at least divalent (e.g., urea, urethane, amide, etc.) can be reacted with azides using at least radiation energy to initiate the reaction between at least a portion of the compounds and the azides to form membranes that have surprisingly high selectivities for acid gases relative to nonpolar gases such as hydrocarbons. The membranes are also resistant to COplasticization and have high acid gas flux characteristics. The resultant membranes can be extremely thin (e.g., 10 micrometers or less), which promotes high permeability for the acid gas and can translate into high productivity on a scaled-up, industrial level.