The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Sep. 28, 2009
Sang-ki Chun, Daejeon, KR;
In-seok Hwang, Daejeon, KR;
Dong-wook Lee, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
The present invention relates to a cliche for offset printing for forming a mesh pattern, and more specifically, to a cliche for offset printing comprising a mash pattern with a plurality of intersection units, wherein the plurality of intersection units are formed in a curved shape with a radius of curvature 0.6 to 4 times that of a mesh line width. When the cliche for offset printing of the present invention is used, line width reductions generated around the intersection units during mesh pattern printing may be reduced. As a result, when a final product is manufactured by using the cliche for printing of the present invention, the surface resistance properties of the product may be improved.