The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

Feb. 15, 2013
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventors:

Hanae Ikeda, Tokyo, JP;

Takeshi Kawabata, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04L 29/06 (2006.01); H04L 9/28 (2006.01); H04L 9/00 (2006.01); G09C 1/00 (2006.01); H04L 9/06 (2006.01);
U.S. Cl.
CPC ...
H04L 9/28 (2013.01); G09C 1/00 (2013.01); H04L 9/003 (2013.01); H04L 9/0631 (2013.01); H04L 2209/12 (2013.01);
Abstract

According to an embodiment, a cryptographic processing apparatus performs processes to encrypt plain text or decrypt cipher text. The processes include a non-linear process using multiplication. The non-linear process is a process performed using intermediate data masked with mask data. The intermediate data is data in a middle of the plurality of processes. The mask data hides the intermediate data. The apparatus includes a non-linear processing unit configured to receive first data that is an exclusive OR of a product of the intermediate data and first mask data and second mask data, and output second data that is an exclusive OR of a product of data obtained by the non-linear process on the intermediate data and data obtained by the non-linear process on the first mask data and third mask data having a predetermined correspondence relation with the second mask data.


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