The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Feb. 17, 2012
Applicants:
Yusuke Takano, Tokyo, JP;
Tatsuro Nagahara, Shizuoka, JP;
Shinde Ninad, Shizuoka, JP;
Takafumi Iwata, Aichi, JP;
Inventors:
Yusuke Takano, Tokyo, JP;
Tatsuro Nagahara, Shizuoka, JP;
Shinde Ninad, Shizuoka, JP;
Takafumi Iwata, Aichi, JP;
Assignee:
MERCK PATENT GMBH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/76 (2006.01); H01L 21/762 (2006.01); H01L 21/02 (2006.01); H01L 23/532 (2006.01); C23C 18/12 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76224 (2013.01); C23C 18/122 (2013.01); C23C 18/127 (2013.01); C23C 18/1212 (2013.01); C23C 18/1291 (2013.01); H01L 21/02164 (2013.01); H01L 21/02222 (2013.01); H01L 21/02282 (2013.01); H01L 21/02323 (2013.01); H01L 21/02326 (2013.01); H01L 23/5329 (2013.01); H01L 2924/0002 (2013.01);
Abstract
[Problem] To provide a method capable of forming an insulating film having homogeneous and high bulk density and less suffering defects. [Means for solving] A substrate surface is coated with a silicon dioxide dispersion containing silicon dioxide fine particles, a polymer, a surfactant and a dispersion medium; and then further coated with a polysilazane composition; and thereafter heated to form an insulating film.