The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
May. 27, 2014
Applicants:
Ashwini K. Sinha, East Amherst, NY (US);
Lloyd A. Brown, East Amherst, NY (US);
Inventors:
Ashwini K. Sinha, East Amherst, NY (US);
Lloyd A. Brown, East Amherst, NY (US);
Assignee:
PRAXAIR TECHNOLOGY, INC., Danbury, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/265 (2006.01); H01L 21/67 (2006.01); H01J 37/08 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01L 21/265 (2013.01); H01J 37/08 (2013.01); H01J 37/3171 (2013.01); H01L 21/67017 (2013.01); H01J 2237/006 (2013.01); Y10T 137/86348 (2015.04); Y10T 137/88054 (2015.04);
Abstract
A novel method and system for using aluminum dopant compositions is provided. A composition of the aluminum dopant compositions is selected with sufficient vapor pressure and minimal carbon content, thereby enabling ease of delivery to an ion implant process and substantial reduction of carbon deposition during Al ion implantation. The source material is preferably stored and delivered from a sub-atmospheric storage and delivery device to enhance safety and reliability during the Al ion implantation process.