The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

May. 14, 2007
Applicants:

Siegfried Krassnitzer, Feldkirch, AT;

Jürg Hagmann, Sax, CH;

Juergen Gwehenberger, Dafins, AT;

Inventors:

Siegfried Krassnitzer, Feldkirch, AT;

Jürg Hagmann, Sax, CH;

Juergen Gwehenberger, Dafins, AT;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/56 (2006.01); C23C 14/32 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3266 (2013.01); C23C 14/325 (2013.01); H01J 37/32055 (2013.01); H01J 37/32614 (2013.01); H01J 37/345 (2013.01); H01J 37/3452 (2013.01); H01J 37/3458 (2013.01); C23C 14/564 (2013.01);
Abstract

The invention relates to an arc source with a target () having a target front face () for the vacuum vaporization of the target material, a target backside with a cooling plate (), a central target region (Z) as well as a target margin. The arc source further comprises a magnet configuration () with an inner magnet system () and/or an outer magnet system () for the generation of a magnetic field in the proximity of the target front face. At least one of the magnet systems () is herein radially poled and effects alone or in connection with the particular other magnet system that the field lines of the magnetic field extend here substantially parallel to the target front face ().


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