The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

Dec. 02, 2013
Applicants:

Masatoshi Murakami, Osaka, JP;

Tatsuya Miyadera, Kanagawa, JP;

Masayuki Hayashi, Osaka, JP;

Yoshinori Shirasaki, Osaka, JP;

Motohiro Kawanabe, Osaka, JP;

Inventors:

Masatoshi Murakami, Osaka, JP;

Tatsuya Miyadera, Kanagawa, JP;

Masayuki Hayashi, Osaka, JP;

Yoshinori Shirasaki, Osaka, JP;

Motohiro Kawanabe, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/385 (2006.01); B41J 2/435 (2006.01); G03G 15/043 (2006.01); G03G 15/00 (2006.01);
U.S. Cl.
CPC ...
G03G 15/043 (2013.01); G03G 15/5058 (2013.01); G03G 2215/0161 (2013.01);
Abstract

An optical writing control device includes a light emission control unit that controls light emission of a light source to exposes a photosensitive element. The light emission control unit is configured to draw two patterns as patterns for correction used to correct a transfer position of a developer image obtained by developing an electrostatic latent image formed on the photosensitive element, the two patterns including a narrow width pattern where a width of the pattern corresponds to a width of a detection area of a sensor that detects the patterns, in the main-scanning direction, and a wide width pattern having a wider width than the narrow width pattern, and control the light emission, after calculation of a correction value based on a detection signal of the wide width pattern is properly completed, in a manner where the narrow width pattern is drawn upon the calculation of the correction value.


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