The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Mar. 30, 2010
Applicants:
Rajesh Menon, Salt Lake City, UT (US);
Trisha L. Andrew, Cambridge, MA (US);
Francesco Stellacci, Somerville, MA (US);
Inventors:
Rajesh Menon, Salt Lake City, UT (US);
Trisha L. Andrew, Cambridge, MA (US);
Francesco Stellacci, Somerville, MA (US);
Assignee:
Massachusettes Institute of Technology, Cambridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03B 27/00 (2006.01);
U.S. Cl.
CPC ...
G03B 27/00 (2013.01);
Abstract
An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.