The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

Jul. 19, 2010
Applicants:

Elisa Fabiani, La Buisse, FR;

Jean Rinkel, Grenoble, FR;

Joachim Tabary, Grenoble, FR;

Jean-marc Dinten, Lyons, FR;

Inventors:

Elisa Fabiani, La Buisse, FR;

Jean Rinkel, Grenoble, FR;

Joachim Tabary, Grenoble, FR;

Jean-Marc Dinten, Lyons, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/203 (2006.01); G01V 5/00 (2006.01); G01N 37/00 (2006.01);
U.S. Cl.
CPC ...
G01N 23/203 (2013.01); G01V 5/0025 (2013.01); G01N 2223/615 (2013.01);
Abstract

The invention relates to a device for identifying a material of an object having a source of X-Ray photons and a spectrometric detector, the source irradiating the object with an incident beam and the detector measuring a magnitude of a backscattered beam from the incident beam after scattering in a volume (δV) of the material and an energy of the X-Ray photons of the backscattered beam. The incident and backscattered beams forming a scattering angle (θ). An adjusting device adjusts the position between the source, the detector and the object in order for the volume to be at different depths with a constant angle. A processing device processes the two magnitudes in two positions and the energy in one position and calculates an attenuation coefficient (μmaterial (E, E, ε)). An estimating device estimates the density (ρ) of the material.


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