The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Nov. 17, 2011
Maher I. Boulos, Sherbrooke, CA;
Jiayin Guo, Sherbrooke, CA;
Jerzy Jurewicz, Sherbrooke, CA;
Gang Han, Yasugi, JP;
Shujiroh Uesaka, Yasugi, JP;
Tatsuya Shoji, Yasugi, JP;
Maher I. Boulos, Sherbrooke, CA;
Jiayin Guo, Sherbrooke, CA;
Jerzy Jurewicz, Sherbrooke, CA;
Gang Han, Yasugi, JP;
Shujiroh Uesaka, Yasugi, JP;
Tatsuya Shoji, Yasugi, JP;
HITACHI METALS, LTD., Tokyo, JP;
TEKNA PLASMA SYSTEMS INC., Quebec, CA;
Abstract
A device for producing titanium metal comprises (a) a first heating unit that heats and gasifies magnesium and a first channel that feeds the gaseous magnesium, (b) a second heating unit that heats and gasifies titanium tetrachloride so as to have a temperature of at least 1600° C. and a second channel that feeds the gaseous titanium tetrachloride, (c) a venturi section at which the second channel communicates with an entrance channel, the first channel merges into a throat and as a result the magnesium and the titanium tetrachloride combine in the throat and a mixed gas is formed in the exit channel, and in which the temperature of the throat and the exit channel is regulated to be at least 1600° C., (d) a titanium metal deposition unit that communicates with the exit channel and has a substrate for deposition with a temperature in the range of 715-1500° C., and (e) a mixed gas discharge channel that communicates with the titanium metal deposition unit.