The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Aug. 19, 2010
Ko Kato, Kizugawa, JP;
Shigehiko Kanaya, Ikoma, JP;
Hideyuki Matsuura, Toyonaka, JP;
Shinya Takenami, Yokohama, JP;
Tatsuya Nosho, Ikoma, JP;
Yuhki Kubo, Ikoma, JP;
Kiyotaka Ueda, Ikoma, JP;
Ko Kato, Kizugawa, JP;
Shigehiko Kanaya, Ikoma, JP;
Hideyuki Matsuura, Toyonaka, JP;
Shinya Takenami, Yokohama, JP;
Tatsuya Nosho, Ikoma, JP;
Yuhki Kubo, Ikoma, JP;
Kiyotaka Ueda, Ikoma, JP;
Abstract
An object of the present invention is to identify sequence features of the 5' UTR, which are involved in changes in the translational state of plants under environmental stresses, and to provide a recombinant DNA molecule, an expression vector, a transformant, and the like, having the above sequence features. The present invention provides a recombinant DNA molecule encoding mRNA containing the 5′ UTR (a) or (b) defined below, a vector obtained by ligating the recombinant DNA molecule to a site immediately downstream of the transcription initiation point of a promoter, and a transformant comprising the vector: (a) 5′ UTR in which a sequence of bases 1 to 7 and a sequence of bases 12 to 32 from the 5′ end are, respectively, a sequence of bases 1 to 7 and a sequence of bases 12 to 32 of SEQ ID NO: 4, 6, 20, 36, or 60; and (b) 5′ UTR in which one or more bases in the base sequence of the 5′ UTR of (a) are replaced, and which escapes translational repression induced by at least one environmental stress selected from the group consisting of heat stress and salt stress.