The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

Mar. 13, 2009
Applicants:

Xavier Bulliard, Yongin-si, KR;

Kwang Hee Lee, Suwon-si, KR;

Jong Jin Park, Yongin-si, KR;

Yun Hyuk Choi, Seoul, KR;

IN Sik IN, Chingju-si, KR;

Inventors:

Xavier Bulliard, Yongin-si, KR;

Kwang Hee Lee, Suwon-si, KR;

Jong Jin Park, Yongin-si, KR;

Yun Hyuk Choi, Seoul, KR;

In Sik In, Chingju-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 19/00 (2006.01); C09J 7/02 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
C09J 7/0221 (2013.01); H01L 51/5237 (2013.01); Y10T 428/1059 (2015.01); Y10T 428/239 (2015.01);
Abstract

A multilayer film is provided. The multilayer film includes a barrier layer and an adhesive layer underlying the barrier layer. The adhesive layer contains a block copolymer that can phase separate into two or more different domains. The multilayer film has good gas and moisture barrier properties and is highly flexible. Therefore, the multilayer film can be effectively used in manufacturing encapsulation structures for electronic devices. In addition, the multilayer film is suitable for use as a substrate for a device. Further provided are a method for producing the multilayer film and an encapsulation structure including the multilayer film.


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