The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
May. 30, 2014
Pall Corporation, Port Washington, NY (US);
Khaled Abdel-Hakim Helmy Aamer, Port Washington, NY (US);
Selina Shi, Levittown, NY (US);
Pall Corporation, Port Washington, NY (US);
Abstract
Disclosed are membranes formed from self-assembling diblock copolymers of the formula (I): wherein Ris C-Calkyl, Ris C-Caryl or heteroaryl, one of Rand Ris a C-Caryl and the other is C-Calkoxy, and n and m are independently about 10 to about 2000, which find use in preparing nanoporous membranes. Embodiments of the membranes contain the diblock copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such a membrane which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.