The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Sep. 25, 2013
Applicant:
Sanuwave, Inc., Alpharetta, GA (US);
Inventors:
Iulian Cioanta, Milton, GA (US);
Christopher M. Cashman, Duluth, GA (US);
Assignee:
Sanuwave, Inc., Alpharetta, GA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 17/22 (2006.01); A61H 9/00 (2006.01); A61H 23/00 (2006.01); G10K 11/28 (2006.01); A61B 17/225 (2006.01); A61B 17/00 (2006.01);
U.S. Cl.
CPC ...
A61B 17/22004 (2013.01); A61B 17/2202 (2013.01); A61B 17/22022 (2013.01); A61B 17/22029 (2013.01); A61H 9/0057 (2013.01); A61H 23/008 (2013.01); G10K 11/28 (2013.01); A61B 17/2255 (2013.01); A61B 2017/00867 (2013.01); A61B 2017/22024 (2013.01); A61B 2017/22025 (2013.01); A61B 2017/22039 (2013.01); A61B 2017/22054 (2013.01); A61B 2017/22067 (2013.01); A61B 2017/22079 (2013.01); A61B 2017/22082 (2013.01);
Abstract
A shock wave applicator includes a reflector and a shock wave generator disposed in the reflector at a first focal point. The reflector is at least a portion of an ellipsoidal shape having a long and small axis with the first focal point and a second focal point on a long axis, and the reflector terminates at an edge defining a membrane covered-aperture on plane intersecting the small axis and coincident with the second focal point.