The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Sep. 23, 2011
David W. Baarman, Fennville, MI (US);
William T. Stoner, Jr., Ada, MI (US);
Joshua K. Schwannecke, Grand Rapids, MI (US);
Kaitlyn J. Turner, Kentwood, MI (US);
Benjamin C. Moes, Wyoming, MI (US);
David W. Baarman, Fennville, MI (US);
William T. Stoner, Jr., Ada, MI (US);
Joshua K. Schwannecke, Grand Rapids, MI (US);
Kaitlyn J. Turner, Kentwood, MI (US);
Benjamin C. Moes, Wyoming, MI (US);
Access Business Group International LLC, Ada, MI (US);
Abstract
A selectively controllable electromagnetic shield having an electromagnetic shielding material and a mechanism for selectively generating an aperture in the shield. The mechanism for selectively generating an aperture may be a magnetic field source that generates a magnetic field of sufficient strength to substantially saturate all or a portion of the shielding material. For example, a permanent magnet or DC electromagnet may be used to selectively saturate the shield. In its un-saturated state, the magnetic shield has a high permeability and functions as a flux path for the magnetic field. Once saturated, the permeability of the shield is substantially reduced so that the magnetic field lines are no longer drawn into the shield to the same degree. As a result, once saturated, a substantially greater amount of the electromagnetic field may flow through or around the shield in the saturated region.