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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9161427 B1

PDFFull Text
Expired
Date of Patent:
Oct. 13, 2015

Filed:

Feb. 17, 2010

Device and method for generating a plasma discharge for patterning the surface of a substrate

Applicants:

Paulus Petrus Maria Blom, Veldhoven, NL;

Alquin Alphons Elisabeth Stevens, Eindhoven, NL;

Laurentia Johanna Huijbregts, Eindhoven, NL;

Hugo Anton Marie DE Haan, Son, NL;

Antonius Hubertus Van Schijndel, Deurne, NL;

Edwin Te Sligte, Eindhoven, NL;

Nicolaas Cornelis Josephus Van Hijningen, Eindhoven, NL;

Tom Huiskamp, Eindhoven, NL;

Inventors:

Paulus Petrus Maria Blom, Veldhoven, NL;

Alquin Alphons Elisabeth Stevens, Eindhoven, NL;

Laurentia Johanna Huijbregts, Eindhoven, NL;

Hugo Anton Marie De Haan, Son, NL;

Antonius Hubertus Van Schijndel, Deurne, NL;

Edwin Te Sligte, Eindhoven, NL;

Nicolaas Cornelis Josephus Van Hijningen, Eindhoven, NL;

Tom Huiskamp, Eindhoven, NL;

Assignee:

Vision Dynamics Holding B.V., Eindhoven, NL;

Attorney:

Banner & Witcoff, Ltd.

Primary Examiner:

Lan Vinh

Int. Cl.
CPC ...
C23F 1/00 (2006.01); H05H 1/46 (2006.01); H05H 1/44 (2006.01); C23C 16/04 (2006.01); C23C 16/503 (2006.01); C23C 16/509 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); C23C 16/042 (2013.01); C23C 16/503 (2013.01); C23C 16/509 (2013.01); H05H 1/24 (2013.01); H05H 1/44 (2013.01);
Abstract

Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.

Find Patent Forward Citations

Blom, Paulus Petrus Maria. (2015). Device and method for generating a plasma discharge for patterning the surface of a substrate (U.S. Patent No. 9161427). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9161427

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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