The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Dec. 18, 2008
Applicants:

Kohei Yokoyama, Kanagawa, JP;

Yosuke Sato, Kanagawa, JP;

Tomoya Aoyama, Kanagawa, JP;

Rena Takahashi, Kanagawa, JP;

Inventors:

Kohei Yokoyama, Kanagawa, JP;

Yosuke Sato, Kanagawa, JP;

Tomoya Aoyama, Kanagawa, JP;

Rena Takahashi, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01); H01L 51/00 (2006.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0013 (2013.01); C23C 14/048 (2013.01); Y10T 428/24331 (2015.01);
Abstract

An evaporation donor substrate that makes it possible to evaporate only a desired evaporation material in the case of performing deposition by an evaporation method. Thus, the use efficiency of an evaporation material can be increased resulting in reduction in production cost, and further a film with high uniformity can be deposited. The evaporation donor substrate can be obtained by forming a reflective layer having an opening over a substrate, forming a thermal insulation layer having a light-transmitting property separately over the substrate and the reflective layer, forming a light absorption layer over the thermal insulation layer, and forming a material layer over the light absorption layer.


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