The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Jul. 24, 2013
Applicants:

International Business Machines Corporation, Armonk, NY (US);

Centre National DE LA Recherche Scientifique, Paris, FR;

Inventors:

Catherine A. Dubourdieu, New York, NY (US);

Martin M. Frank, Dobbs Ferry, NY (US);

Bipin Rajendran, New York, NY (US);

Alejandro G. Schrott, New York, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 45/00 (2006.01); G11C 11/22 (2006.01); G11C 13/00 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1608 (2013.01); G11C 11/22 (2013.01); G11C 13/0004 (2013.01); G11C 13/0069 (2013.01); H01L 45/06 (2013.01); H01L 45/12 (2013.01); H01L 45/1233 (2013.01); H01L 45/143 (2013.01); H01L 45/144 (2013.01); G11C 2013/0095 (2013.01);
Abstract

An example embodiment disclosed is a process for fabricating a phase change memory cell. The method includes forming a bottom electrode, creating a pore in an insulating layer above the bottom electrode, depositing piezoelectric material in the pore, depositing phase change material in the pore proximate the piezoelectric material, and forming a top electrode over the phase change material. Depositing the piezoelectric material in the pore may include conforming the piezoelectric material to at least one wall defining the pore such that the piezoelectric material is deposited between the phase change material and the wall. The conformal deposition may be achieved by chemical vapor deposition (CVD) or by atomic layer deposition (ALD).


Find Patent Forward Citations

Loading…