The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

May. 21, 2012
Applicants:

Kentaro Saito, Kanagawa, JP;

Kazumasa Yanagisawa, Kanagawa, JP;

Yasushi Ishii, Kanagawa, JP;

Koichi Toba, Kanagawa, JP;

Inventors:

Kentaro Saito, Kanagawa, JP;

Kazumasa Yanagisawa, Kanagawa, JP;

Yasushi Ishii, Kanagawa, JP;

Koichi Toba, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/778 (2006.01); H01L 21/336 (2006.01); H01L 29/792 (2006.01); H01L 21/28 (2006.01); H01L 27/115 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); G11C 16/04 (2006.01);
U.S. Cl.
CPC ...
H01L 29/792 (2013.01); G11C 16/0466 (2013.01); H01L 21/28282 (2013.01); H01L 27/11573 (2013.01); H01L 29/4234 (2013.01); H01L 29/66833 (2013.01);
Abstract

To improve the electric performance and reliability of a semiconductor device. A memory gate electrode of a split gate type nonvolatile memory is a metal gate electrode formed from a stacked film of a metal filmand a silicon filmover the metal film. In an upper end part of the metal film, a metal oxide portionis formed by oxidation of a part of the metal film. A control gate electrode of the split gate type nonvolatile memory is a metal gate electrode formed from a stacked film of a metal filmand the silicon filmover the metal film


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