The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Mar. 12, 2010
Applicants:

Oliver Ansell, Berkeley, GB;

Anthony Barrass, Thornbury, GB;

Paul Bennett, Bristol, GB;

David Tossell, Bristol, GB;

Inventors:

Oliver Ansell, Berkeley, GB;

Anthony Barrass, Thornbury, GB;

Paul Bennett, Bristol, GB;

David Tossell, Bristol, GB;

Assignee:

SPTS Technologies Limited, Newport, Wales, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); H01J 37/3299 (2013.01); H01J 37/32917 (2013.01); H01J 37/32935 (2013.01); H01J 37/32963 (2013.01); H01J 37/32972 (2013.01); H01J 37/32981 (2013.01);
Abstract

Apparatus for chemically etching a workpiece includes a chamber for receiving a process gas and having a pumping port for extracting exhaust gases, and a workpiece support located in the chamber upstream of the pumping port. The chamber further includes a sub-chamber located upstream of the pumping port and downstream of the workpiece support, and the sub-chamber includes a window and an excitation source, adjacent the window, for creating a plasma in a sample of the exhaust gases to create an optical emission which can be monitored through the window.


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