The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Mar. 15, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Joy Cheng, San Jose, CA (US);

Daniel P. Sanders, San Jose, CA (US);

Melia Tjio, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/38 (2006.01); B05D 1/32 (2006.01); B05D 3/10 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/3105 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0273 (2013.01); B05D 1/32 (2013.01); B05D 1/38 (2013.01); B05D 3/107 (2013.01); B81C 1/00031 (2013.01); H01L 21/0337 (2013.01); H01L 21/31058 (2013.01); B81C 2201/0149 (2013.01);
Abstract

Methods are disclosed for reducing the number of defects in a directed self-assembled structure formed on a guiding pre-pattern (e.g., a chemical pre-pattern) on a substrate. A first layer comprising a first self-assembly material is applied onto the guiding pre-pattern, with the first self-assembly material forming domains whose alignment and orientation are directed by the guiding pre-pattern; as a result, a first self-assembled structure is formed. The first self-assembled structure is washed away, and a second layer comprising a second self-assembly material is then applied. The second self-assembly material forms a second self-assembled structure having fewer defects than the first self-assembled structure.


Find Patent Forward Citations

Loading…