The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Jun. 03, 2014
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Takashi Ogawa, Kanagawa, JP;

Yasutsugu Usami, Kanagawa, JP;

Mitsuhiro Togashi, Kanagawa, JP;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/12 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/12 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/24485 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/281 (2013.01);
Abstract

An electron beam apparatus includes at least one electron beam column. The at least one beam column includes an electron beam optical system to irradiate an electron beam on a surface of a sample, and a detection system to detect electrons generated from the electron beam. The electron beam optical system includes an object lens to focus the electron beam on a surface of the sample. The object lens includes an electrostatic lens having a first electrode to which a first voltage is applied, a second electrode that is grounded, a third electrode to which a second voltage is applied, and a fourth electrode that is grounded. The first through fourth electrodes sequentially arranged relative to the sample.


Find Patent Forward Citations

Loading…