The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
May. 16, 2012
Mark F. Mercado, Morgan Hill, CA (US);
Mohammad T. Mirzamaani, San Jose, CA (US);
Kai Tang, San Jose, CA (US);
Qi-fan Xiao, San Jose, CA (US);
Mark F. Mercado, Morgan Hill, CA (US);
Mohammad T. Mirzamaani, San Jose, CA (US);
Kai Tang, San Jose, CA (US);
Qi-Fan Xiao, San Jose, CA (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
Fabrication methods for magnetic recording media that use a plasma polish are disclosed. For one exemplary method, a film of a magnetic recording medium is deposited, and a top surface of the film is polished utilizing a plasma formed by a noble gas to smoothen the top surface of the film. A subsequent layer is then deposited onto the polished top surface of the film. A top surface of the subsequent layer has a reduced roughness by being deposited on the polished top surface of the film.