The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Dec. 14, 2011
Yosuke Kimura, Wakayama, JP;
Takeshi Hamaguchi, Wakayama, JP;
Makoto Suzuki, Wakayama, JP;
KAO CORPORATION, Tokyo, JP;
Abstract
The present invention provides a polishing liquid composition for a magnetic disk substrate that can reduce residual inorganic particles and scratches without loss of productivity and a method of producing a magnetic disk substrate using the polishing liquid composition. The polishing liquid composition contains inorganic particles, a diallylamine polymer, an acid and water, the diallylamine polymer includes one or more constitutional units selected from those represented by the following general formulas (I-a), (I-b), (I-c) and (I-d), and the content of the diallylamine polymer in the polishing liquid composition is 0.008 to 0.100 wt %
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile