The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Mar. 08, 2012
Guorong Xuan, Shanghai, CN;
Yun-qing Shi, Millburn, NJ (US);
Guorong Xuan, Shanghai, CN;
Yun-Qing Shi, Millburn, NJ (US);
New Jersey Institute of Technology, Newark, NJ (US);
Abstract
Technologies are generally presented for employing enhanced expectation maximization (EEM) in image retrieval and authentication. Using uniform distribution as initial condition, the EEM may converge iteratively to a global optimality. If a realization of the uniform distribution is used as the initial condition, the process may also be repeatable. In some examples, a positive perturbation scheme may be used to avoid boundary overflow, often occurring with the conventional EM algorithms. To reduce computation time and resource consumption, a histogram of one dimensional Gaussian Mixture Model (GMM) with two components and wavelet decomposition of an image may be employed.