The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Mar. 28, 2013
Lockheed Martin Corporation, Bethesda, MD (US);
Sarah M. Taylor, Falls Church, VA (US);
Daniel M. Davenport, Somerdale, NJ (US);
David Menaker, Limerick, PA (US);
Rosemary D. Paradis, Inlet, NY (US);
LOCKHEED MARTIN CORPORATION, Bethesda, MD (US);
Abstract
Diaculture of text can be determined or analyzed by tokenizing words of the text according to a rule set to generate tokenized text, the rule set defining: a first set of grammatical types of words, which are words that are replaced with tokens that respectively indicate a grammatical type of a respective word, and a second set of grammatical types of words, which are words that are passed as tokens without changing. Grams can be constructed from the tokenized text, each gram including one or more of consecutive tokens from the tokenized text. The grams can be compared to a training data set that corresponds to a known diaculture to obtain a comparison result that indicates how well the text matches the training data set for the known diaculture.