The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Mar. 15, 2013
Applicant:

Dynaloy, Llc, Kingsport, TN (US);

Inventors:

Richard Dalton Peters, Kingsport, TN (US);

Travis Acra, Ingalls, IN (US);

Yuanmei Cao, Indianapolis, IN (US);

Spencer Erich Hochstetler, Kingsport, TN (US);

Michael Tod Phenis, Markleville, IN (US);

Kimberly Dona Pollard, Anderson, IN (US);

Assignee:

Dynaloy, LLC, Kingsport, TN (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/42 (2006.01); C11D 7/32 (2006.01); C11D 11/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/422 (2013.01); C11D 7/3218 (2013.01); C11D 7/3263 (2013.01); C11D 7/3281 (2013.01); C11D 11/0047 (2013.01); G03F 7/425 (2013.01);
Abstract

Compositions are described that are useful for removing organic and organometallic substances from substrates, for example, photoresist wafers. Processes are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added and the organic or organometallic substances are completely removed by rinsing. The compositions and processes may be suitable for removing and, in some instances, completely dissolving photoresists of the positive and negative varieties, and specifically negative dry film photoresist from electronic devices.


Find Patent Forward Citations

Loading…