The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Jan. 13, 2014
Applicant:

The Regents of the University of California, Oakland, CA (US);

Inventors:

Damien Montarnal, Maubec, FR;

Craig J. Hawker, Santa Barbara, CA (US);

Edward J. Kramer, Santa Barbara, CA (US);

Glenn H. Fredrickson, Santa Barbara, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/40 (2006.01); G03F 7/075 (2006.01); C08K 5/092 (2006.01); C08L 53/00 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
G03F 7/075 (2013.01); C08K 5/092 (2013.01); C08L 53/00 (2013.01); G03F 7/40 (2013.01); H01L 21/31144 (2013.01);
Abstract

The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.


Find Patent Forward Citations

Loading…