The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Oct. 01, 2013
Applicant:
Kyungpook National University Industry-academic Cooperation Foundation, Daegu, KR;
Inventor:
Hak-Rin Kim, Daegu, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G02F 1/1341 (2006.01); G02F 1/1337 (2006.01); G02F 1/29 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1341 (2013.01); G01B 11/2441 (2013.01); G02F 1/133753 (2013.01); G02F 1/29 (2013.01); G02F 2001/133757 (2013.01); G02F 2001/291 (2013.01);
Abstract
The dynamic fringe pattern generating apparatus includes a liquid crystal layer including a first area and a second area, a lower layer and an upper layer. The upper layer includes a slit array layer where a micro-slit array including a common slit and a plurality of selection slits are formed and an upper transparent electrode layer where a reference electrode and a plurality of selection electrodes are formed. In the dynamic fringe pattern generating apparatus, different fringe patterns are phase-shifted by sequentially controlling a voltage applied to the reference electrode and to the selection electrodes.