The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Jul. 11, 2012
Applicant:

Seung-ho Hong, Medford, OR (US);

Inventor:

Seung-Ho Hong, Medford, OR (US);

Assignee:

Met One Instruments, Inc., Grants Pass, OR (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05B 1/28 (2006.01); G01N 23/02 (2006.01); G01N 1/22 (2006.01);
U.S. Cl.
CPC ...
G01N 23/02 (2013.01); G01N 1/2205 (2013.01); G01N 2001/2223 (2013.01);
Abstract

A particulate mass measuring device of the beta attenuation type featuring a sheath air plenum from which a radial sheath airflow pathway extends which is in fluid communication with an ambient air chamber. The radial sheath airflow from the radial sheath airflow pathway merges with an axial ambient airflow from the ambient air chamber deflecting particulate matter from surfaces of the ambient air chamber thereby increasing the accuracy of particulate mass measurements. The radial sheath airflow is particle free or substantially particle free. In other embodiments, the radial sheath airflow is used to deflect particulate matter in other particulate mass measuring devices, such as those that measure particulate mass in liquid and gas samples.


Find Patent Forward Citations

Loading…